Near-infrared light emission from Al-doped Ta<sub>2</sub>O<sub>5</sub> thin films deposited using a co-sputtering method

OMI KOSUKE; YOSHIDA AKIHITO; MIURA KENTA; NOGUCHI KATSUYA; KADA WATARU; HANAIZUMI OSAMU

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J-GLOBAL ID：202002270481726172 Reference number：20A1994629

Near-infrared light emission from Al-doped Ta₂O₅ thin films deposited using a co-sputtering method

スパッタリング法によるAl添加Ta₂O₅薄膜の作製とその近赤外発光特性の評価

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Volume： 35th Page： 17 Publication year： Sep. 03, 2019
JST Material Number： L6118A Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Properties of ceramics and ceramic whiteware , Manufacturing of ceramics and ceramic whiteware

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Near-infrared light emission from Al-doped Ta2O5 thin films deposited using a co-sputtering method

Near-infrared light emission from Al-doped Ta₂O₅ thin films deposited using a co-sputtering method