Art
J-GLOBAL ID:202002273497339479   Reference number:20A2381542

Optimization of deposition conditions of yttrium doped-SrZrO3 thin films fabricated by pulsed laser deposition

パルスレーザ蒸着により作製したイットリウムドープSrZrO3薄膜の蒸着条件の最適化
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Material:
Volume: 128  Issue:Page: 436-440(J-STAGE)  Publication year: 2020 
JST Material Number: U0409A  ISSN: 1348-6535  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Oxide thin films 

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