Art
J-GLOBAL ID：202002275192556532   Reference number：20A0950926

SiN used as a Stressor in Germanium-On-Insulator Substrate

ゲルマニウム-オン-絶縁体基板におけるストレスまたはとして使用されるSiN【JST・京大機械翻訳】
Author (5)：
Duangchan Sethavut

About Duangchan Sethavut

(King Mongkut’s University of Technology North Bangkok,Department of Industrial Physics and Medical Instrumentation,Bangkok,Thailand)

About King Mongkut’s University of Technology North Bangkok,Department of Industrial Physics and Medical Instrumentation,Bangkok,Thailand

, 
Yamamoto Keisuke

About Yamamoto Keisuke

(Interdisciplinary Graduate School of Engineering Science, Kyushu University,Fukuoka,Japan)

About Interdisciplinary Graduate School of Engineering Science, Kyushu University,Fukuoka,Japan

, 
Wang Dong

About Wang Dong

(Interdisciplinary Graduate School of Engineering Science, Kyushu University,Fukuoka,Japan)

About Interdisciplinary Graduate School of Engineering Science, Kyushu University,Fukuoka,Japan

, 
Nakashima Hiroshi

About Nakashima Hiroshi

(Global Innovation Center, Kyushu University,Fukuoka,Japan)

About Global Innovation Center, Kyushu University,Fukuoka,Japan

, 
Baba Akiyoshi

About Baba Akiyoshi

(Center for Microelectronic Systems, Kyushu Institute of Technology,Fukuoka,Japan)

About Center for Microelectronic Systems, Kyushu Institute of Technology,Fukuoka,Japan


Material：
IEEE Conference Proceedings  (IEEE Conf Proc)

About IEEE Conference Proceedings


Volume： 2019  Issue： 3DIC  Page： 1-5  Publication year： 2019 
JST Material Number： W2441A  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Abstract/Point：
Abstract/Point
Japanese summary of the article(about several hundred characters).
All summary is available on JDreamIII(charged).
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Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*Germanium

About Germanium

, 
silicon nitride

About silicon nitride

, 
pattern formation

About pattern formation

, 
*insulator

About insulator

, 
Si wafer

About Si wafer

, 
stressor

About stressor

, 
tensile strain

About tensile strain

, 
bilayer

About bilayer


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
表面活性化

About 表面活性化

, 
ゲルマニウム基板

About ゲルマニウム基板

, 
ポストアニーリング

About ポストアニーリング

, 【Automatic Indexing@JST】
JST classification (1)：
JST classification
Category name(code) classified by JST.
Graphic and image processing in general 
(JE04010I)

About Graphic and image processing in general

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
ゲルマニウム

About ゲルマニウム

, 
絶縁体

About 絶縁体

, 
ストレス

About ストレス

, 
SiN

About SiN


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