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J-GLOBAL ID：202002278864725299   Reference number：20A0837801

Fabrication and characterization of ReO₃-type dielectric films

ReO_3型誘電体膜の作製と特性評価【JST・京大機械翻訳】

Author (5)： Kodera Masanori (Material Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama, 226-8502, Japan. [e-mail] [e-mail]) ,  Taguchi Ayako ,  Shimizu Takao ,  Moriwake Hiroki ,  Funakubo Hiroshi
Material： Journal of Materials Chemistry C. Materials for Optical, Magnetic and Electronic Devices  (Journal of Materials Chemistry C. Materials for Optical and Electronic Devices)
Volume： 8  Issue： 14  Page： 4680-4684  Publication year： 2020 
JST Material Number： W2383A  ISSN： 2050-7526  CODEN： JMCCCX  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： ReO₃-type NbO<sub>2...

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Thesaurus term： *dielectric thin film ,  characterization ,  thin film ,  dielectric material ,  dielectric property ,  electronic component ,  permittivity ,  oxidation ,  band gap energy ,  oxyfluoride ,  hydrothermal treatment

JST classification (1)： Bases,metal oxides  (CD01030Z)

Terms in the title (3)： 誘電体膜 ,  作製 ,  特性評価