Art

J-GLOBAL ID：202102238275221113   Reference number：21A0133649

Fabrication of folded bilayer-bilayer graphene/hexagonal boron nitride superlattices

折り畳まれた二層-二層グラフェン/六方晶窒化ホウ素超格子の作製

Author (9)： IWASAKI Takuya (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  MORITA Yoshifumi (Gunma Univ., Gunma, JPN) ,  NAKAHARAI Shu (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  WAKAYAMA Yutaka (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  WATANABE Eiichiro (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  TSUYA Daiju (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  WATANABE Kenji (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  TANIGUCHI Takashi (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN) ,  MORIYAMA Satoshi (National Inst. for Materials Sci. (NIMS), Ibaraki, JPN)
Material： Applied Physics Express  (APEX)
Volume： 13  Issue： 3  Page： 035003.1-035003.4  Publication year： Mar. 2020 
JST Material Number： F0599C  ISSN： 1882-0778  CODEN： APEPC4  Document type： Article
Article type： 短報  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： *folded structure ,  multistory structure ,  *graphene ,  *boron nitride ,  *superlattice ,  wafer ,  silicon dioxide ,  doping ,  interlaminer peeling ,  *device structure ,  electron beam lithography ,  plasma etching ,  pattern formation ,  laminate structure ,  binding and coupling ,  electric resistance ,  bilayer structure ,  *hexagonal boron nitride ,  *hetero-structure ,  Si wafer
Semi thesaurus term： silicon substrate ,  patterning ,  interlayer coupling

JST classification (1)： Semiconductor-semiconductor contacts with Gr.13-15 element compounds  (BM03082Y)

Terms in the title (5)： 二層 ,  二層グラフェン ,  六方晶窒化ホウ素 ,  超格子 ,  作製