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J-GLOBAL ID:202102257758294431   Reference number:21A0577152

Contribution to the Physical Modelling of Single Charged Defects Causing the Random Telegraph Noise in Junctionless FinFET

無接合FinFETにおけるランダム電信雑音を引き起こす単一荷電欠陥の物理的モデリングへの寄与【JST・京大機械翻訳】
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Volume: 10  Issue: 15  Page: 5327  Publication year: 2020 
JST Material Number: U7135A  ISSN: 2076-3417  Document type: Article
Article type: 原著論文  Country of issue: Switzerland (CHE)  Language: ENGLISH (EN)
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In this paper, different physi...
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Transistors 
Reference (30):
  • Kaczer, B.; Franco, J.; Weckx, P.; Roussel, P.J.; Putcha, V.; Bury, E.; Simicic, M.; Chasin, A.; Linten, D.; Parvais, B.; et al. A brief overview of gate oxide defect properties and their relation to MOSFET instabilities and device and circuit time-dependent variability. Microelectron. Reliab. 2018, 81, 186-194.
  • Kang, C.J.; Buh, G.H.; Lee, S.; Kim, C.K.; Mang, K.M.; Im, C.; Kuka, Y. Charge trap dynamics in a SiO2 layer on Si by scanning capacitance Microscopy. Appl. Phys. Lett. 1999, 74, 1815-1817.
  • Sriram, S.R.; Bindu, B. Analytical modeling of random discrete traps induced threshold voltage fluctuations in double-gate MOSFET with HfO2/SiO2 gate dielectric stack. Microelectron. Reliab. 2019, 99, 87-95.
  • Toh, S.O.; Liu, T.J.K.; Nikolic, B. Impact of Random Telegraph Signaling Noise on SRAM Stability. In Proceedings of the 2011 Symposium on VLSI Technology-Digest of Technical Papers, Honolulu, HI, USA, 14-16 June 2011; pp. 204-205.
  • Kao, T.H.; Chang, S.J.; Fang, Y.K.; Huang, P.C.; Wang, B.C.; Wu, C.Y.; Wu, S.L. Investigation of low-frequency noise of 28-nm technology process, of high-k/metal gate p-MOSFETs with fluorine incorporation. Solid-State Electron. 2016, 115, 7-11.
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