Art

J-GLOBAL ID：202102272104144992   Reference number：21A0255977

Formation of Fine Periodic Structures on Back Surface of Si Substrate by a Femtosecond Laser at 1552 nm

1552nmでのフェムト秒レーザによるSi基板の裏面上の微細周期構造の形成

Author (6)： ITO Yoshiro (Nagaoka Univ. Technol., Niigata, JPN) ,  CHIAH Sin Ying (Nagaoka Univ. Technol., Niigata, JPN) ,  LUONG Khanh Phu (Nagaoka Univ. Technol., Niigata, JPN) ,  KATAOKA Daiki (Nagaoka Univ. Technol., Niigata, JPN) ,  TANABE-YAMAGISHI Rie (Nagaoka Univ. Technol., Niigata, JPN) ,  TANABE-YAMAGISHI Rie (Fukuoka Inst. of Technol., Fukuoka, JPN)
Material： Journal of Laser Micro/Nanoengineering (Web)  (J Laser Micro Nanoeng (Web))
Volume： 15  Issue： 2  Page： 111-117 (WEB ONLY)  Publication year： Sep. 2020 
JST Material Number： U0377A  ISSN： 1880-0688  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *wafer ,  femtosecond ,  *laser beam machining ,  periodic structure ,  infrared laser ,  *pattern formation ,  micro structure ,  wet etching ,  energy ,  laser irradiation ,  vertical direction ,  semiconductor ,  fine patterning ,  surface structure ,  band gap energy ,  laser induced ,  Si wafer ,  structure
Semi thesaurus term： silicon substrate

JST classification (2)： Applications of lasers  (BD04100V) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (41)：

• C.Y. Chang and S.M. Sze: “ULSI Technology”, (McGraw Hill, New York, 1996)
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• X. Q. Liu, L. Yu, Z. C. Ma, and Q. D. Chen: Appl. Optics, 56, (2017) 2157.
• S. Yadavali, D. Lee, and D. Issadore: Sci. Rep. 9, (2019) 12213.
• Y. Ito, R. Tanabe, and K. Tada: MRS Symp. Proc., 1365, (2011) 31.

Terms in the title (4)： フェムト秒レーザ ,  Si基板 ,  微細 ,  周期構造