Relation between the resistance to implantation of stereoelectroencephalography (SEEG) and the angle of the gyrus puncture

KIMOTO YUKI; KHOO Hui Ming; TANI NAOKI; KIMOTO YUKI; KHOO Hui Ming; TANI NAOKI; HOSOMI KOICHI; OSHINO SATORU; FUJITA YUYA; MIURA SHIMPEI; IWATA TAKAMITSU; EMURA TAKUTO; MATSUHASHI TAKAHIRO; ONODA YUJI; ISHIUCHI TAKAMASA; YANAGISAWA TAKUFUMI; HIRATA MASAYUKI; KISHIMA HARUHIKO; OSHINO SATORU; FUJITA YUYA; MIURA SHIMPEI; IWATA TAKAMITSU; EMURA TAKUTO; MATSUHASHI TAKAHIRO; ONODA YUJI; ISHIUCHI TAKAMASA; YANAGISAWA TAKUFUMI; HIRATA MASAYUKI; KISHIMA HARUHIKO

Art

J-GLOBAL ID：202202227098357528 Reference number：22A2141893

Relation between the resistance to implantation of stereoelectroencephalography (SEEG) and the angle of the gyrus puncture

定位的頭蓋内脳波(SEEG)電極を留置する際の抵抗と脳回刺入角度の検討

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Volume： 40 Issue： 2 Page： 488 Publication year： Aug. 15, 2022
JST Material Number： S0158B ISSN： 0912-0890 Document type： Article
Article type：会議録記事 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Neurologic diagnosis , Surgical treatment for nervous system diseases

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