Rchr
J-GLOBAL ID：200901032847091743
Update date: Feb. 04, 2024
Muta Hiroshi
ムタ ヒロシ | Muta Hiroshi
Affiliation and department：
Job title：
Professor
Research theme for competitive and other funds (5)：
- 2013 - 2016 超音速噴流を用いたVHFプラズマによる高速大面積微結晶シリコン製膜法の開発
- 2008 - 2011 狭ギャップ高圧VHFプラズマを用いた微結晶シリコン薄膜作製
- 2007 - 2010 中性粒子風と渦の極性反転
- 2002 - 2003 低温プラズマ表面修飾技術による酸化チタン微粒子の環境浄化機能の改善に関する研究
- 1998 - 2000 ECRプラズマ中の電子速度分布関数と成膜の再現性に関する研究
Papers (68)：
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Hiroshi Muta, Hiroyuki Taguchi, Teppei Yamanishi, Go Hirano, Satoshi Nishida. Characteristics of very high-frequency plasma with an underexpanded supersonic gas jet. Vacuum. 2023. 217. 112530-1-112530-7
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西田 哲, 納土 亮, 牟田 浩司, 栗林 志頭眞. 非平衡プラズマジェットCVD法によるシリコン製膜時に装置内圧力が製膜速度,膜質におよぼす影響. 化学工業論文集. 2015. 41. 2. 148-152
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S. Nishida, H. Muta, S. Kuribayashi. Plasma CVD with High Deposition Rate using High Speed Jets. NAGARE. 2015. 34. 1. 15-20
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Tsukasa Yamane, Shinya Nakano, Sachiko Nakao, Yoshiaki Takeuchi, Ryuta Ichiki, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai. Estimation of negative ions in VHF SiH4/H-2 plasma. JAPANESE JOURNAL OF APPLIED PHYSICS. 2014. 53. 11. 116101-1-116101-4
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Satoshi Nishida, Hiroshi Muta, Shizuma Kuribayashi. Effect of gas flow rate on the high-rate, localized jet-deposition of silicon in SiH4/H-2 PE-CVD. JOURNAL OF CHEMICAL ENGINEERING OF JAPAN. 2014. 47. 6. 478-482
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MISC (7)：
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Nodo Ryo, Matsunaga Takuma, Iseki Masahito, Muta Hiroshi, Nishida Satoshi, Kuribayashi Shizuma. B132 Experimental research of the degree of Si crystallinity controlling method in the non-equilibrium plasma jet CVD. Procee[d]ings of Thermal Engineering Conference. 2013. 2013. 57-58
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Matsuoka Kazuki, Okamoto Naoki, Ando Daisuke, Nakamura Jiro, Nishida Satoshi, Muta Hiroshi, Kuribayashi Shizuma. G212 Influence of gas flow rate on Si deposition rate by non-equilibrium plasma CVD. Procee[d]ings of Thermal Engineering Conference. 2012. 2012. 435-436
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ANDO Daisuke, NAKAMURA Jiro, TSUNEKAWA Yoshihiro, NISHIDA Satoshi, MUTA Hiroshi, KURIBAYASHI Shizuma, TAKEUCHI Yoshiaki, YAMAUCHI Yoshihiro, TAKATSUKA Hiromu. Using a Supersonic Under-Expanded Jet α/μc-Si:H Deposition by Non-equilibrium VHF Plasma Enhanced CVD. 2010. 2010. 48. 5-10
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MIZUNO Kenta, MATSUOKA Masanori, MUTA Hiroshi, NISHIDA Satoshi, KURIBAYASHI Shizuma, TAKEUCHI Yoshiaki, YAMAUCHI Yasuhiro, TAKATSUKA Hiromu. Characteristics of VHF Plasma Produced by a Balanced Power Feeding Method. 2010. 2010. 48. 29-32
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Muta Hiroshi, Koga Mayuko, Kawai Yoshinobu. 29pA06P Numerical Investigation of the Ion Temperature in an Ar/N_2 ECR Plasma. 2002. 19. 205-205
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Books (1)：
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プラズマCVDにおける成膜条件の最適化に向けた反応機構の理解とプロセス制御・成膜事例
サイエンス&テクノロジー 2018
Professional career (1)：
- Doctor of Engineering (Kyushu University)
Work history (1)：
- 2015/04 - 現在 Kinki University, Human-oriented Engineering Professor
Committee career (1)：
Awards (1)：
Association Membership(s) (3)：
電気学会
, プラズマ・核融合学会
, 応用物理学会
