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ArticleJ-GLOBAL ID:200902015666633198整理番号:89A0554480

Deep surface damage of SiO2 by sputtering with low energy Ar-ions.

低速のArイオンを用いたスパッタリングによるSiO2の深い表面損傷

著者:COLLART E(Philips Research Lab., Eindhoven, The Netherlands)、VISSER R J(Philips Research Lab., Eindhoven, The Netherlands)
資料名:Surf Sci 巻:218 号:2/3 ページ:L497-L504
発行年:1989年08月
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