Rchr
J-GLOBAL ID:200901098218885908   Update date: Jan. 31, 2024

Sobajima Yasushi

ソバジマ ヤスシ | Sobajima Yasushi
Affiliation and department:
Research field  (1): Electric/electronic material engineering
Research keywords  (2): アモルファスおよび微結晶半導体 ,  Amorphous and microcrystalline semiconductors
Research theme for competitive and other funds  (5):
  • 2022 - 2025 ペロブスカイト太陽電池の長期耐久評価に向けた加速試験手法の創成
  • 2017 - 2020 Elucidation of electrical conduction mechanism under light irradiation in organic-inorganic hybrid perovskite semiconductor
  • 2014 - 2016 Control of film growth process at n/i interface in nano-crystalline silicon based solar cells using SiH4 plasma diagnostics
  • 2005 - 薄膜微結晶シリコン太陽電池の高速度製膜並びに高品位化
  • 2005 - High-rate deposition of microcrystalline silicon thin films for photovoltaic layer of solar cells
Papers (20):
  • Go Sian Huai, Kiyoshiro Takada, Kota Ono, Shingo Hashimoto, Naing Lin Htun, Fumitaka Ohashi, Norimitsu Yoshida, Yasushi Sobajima, Shuichi Nonomura. Recovery of potential-induced degraded p-type multicrystalline Si PV modules by application of a reverse DC bias. Japanese Journal of Applied Physics. 2022. 61. 4. 041002-041002
  • Yasushi Sobajima, Shota Kinoshita, Shinnosuke Kakimoto, Ryoji Okumoto, Chitose Sada, Akihisa Matsuda, Hiroaki Okamoto. Control of growth process for obtaining high-quality a-SiO:H. CANADIAN JOURNAL OF PHYSICS. 2014. 92. 7-8. 582-585
  • Y. Sobajima, H. Muto, C. Sada, A. Matsuda, H. Okamoto. Control of electron temperature in SiH4/H-2 plasma for obtaining high photovoltaic performance in microcrystalline silicon solar cells. 11TH APCPST (ASIA PACIFIC CONFERENCE ON PLASMA SCIENCE AND TECHNOLOGY) AND 25TH SPSM (SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS). 2013. 441
  • Yasushi Sobajima, Hirotaka Muto, Yoshihiro Shinohara, Chitose Sada, Akihisa Matsuda, Hiroaki Okamoto. Fundamental Properties of Titanium-Doped Indium Oxide and Its Application to Thin-Film Silicon Solar Cells. JAPANESE JOURNAL OF APPLIED PHYSICS. 2012. 51. 10
  • Y. Sobajima, S. Kamanaru, H. Muto, J. Chantana, C. Sada, A. Matsuda, H. Okamoto. Effect of thermal annealing and hydrogen-plasma treatment in boron-doped microcrystalline silicon. JOURNAL OF NON-CRYSTALLINE SOLIDS. 2012. 358. 17. 1966-1969
more...
MISC (33):
Works (5):
  • トリプル型の最適デバイス構造設計技術
    2008 -
  • トリプル型の最適デバイス構造設計技術
    2007 -
  • ナノ構造光閉じ込め基板を用いた薄膜シリコン太陽電池の開発
    2007 -
  • トリプル型の最適デバイス構造設計技術
    2006 -
  • ナノ構造光閉じ込め基板を用いた薄膜シリコン太陽電池の開発
    2006 -
Professional career (1):
  • 博士(工学) (岐阜大学)
Work history (4):
  • 2018/04 - 現在 Gifu University Faculty of Engineering
  • 2008/04 - 2018/03 Osaka University Graduate School of Engineering Science
  • 2007/04 - 2008/03 Osaka University Graduate School of Engineering Science
  • 2004/07 - 2007/03 Osaka University Graduate School of Engineering Science
Awards (3):
  • 2008 - 第24回(2008年春季)応用物理学会講演奨励賞
  • 2007 - Young Researcher Awards
  • 2007 - Young Researcher Awards
Association Membership(s) (1):
応用物理学会
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

Return to Previous Page