Art
J-GLOBAL ID：201702272938038331   Reference number：17A0392361

Characteristics of Compactness of SiO_2Thin Films Prepared byPECVD Method

PECVD法によりSIO_2薄膜の緻密性を特性化した。【JST・京大機械翻訳】
  • Publisher site Copy service
  • Access JDreamⅢ for advanced search and analysis.
Author (5)：
Xiao Heping

About Xiao Heping

(Yangzhou Changelight Co.,Ltd.)

About Yangzhou Changelight Co.,Ltd.

, 
Sun Rujian

About Sun Rujian

(Yangzhou Changelight Co.,Ltd.)

About Yangzhou Changelight Co.,Ltd.

, 
Ma Xiangzhu

About Ma Xiangzhu

(Yangzhou Changelight Co.,Ltd.)

About Yangzhou Changelight Co.,Ltd.

, 
Yang Kai

About Yang Kai

(Yangzhou Changelight Co.,Ltd.)

About Yangzhou Changelight Co.,Ltd.

, 
Zhang Shuangxiang

About Zhang Shuangxiang

(Yangzhou Changelight Co.,Ltd.)

About Yangzhou Changelight Co.,Ltd.


Material：
Jiguang Yu Dianzixue Jinzhan

About Jiguang Yu Dianzixue Jinzhan


Volume： 53  Issue： 12  Page： 123101-1-123101-6  Publication year： 2016 
JST Material Number： C2698A  ISSN： 1006-4125  Document type： Article
Article type： 原著論文  Country of issue： China (CHN)  Language： CHINESE (ZH)
Abstract/Point：
Abstract/Point
Japanese summary of the article(about several hundred characters).
All summary is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Plasma enhanced chemical vapor...
Register(free) or Log In to access 

Please login to MyJ-GLOBAL to see full information. You also need to select "Display abstract, etc. of medical articles" in your MyJ-GLOBAL account page in order to see abstracts, etc. of medical articles.

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=17A0392361&from=J-GLOBAL&jstjournalNo=C2698A") }}
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
flow rate

About flow rate

, 
*thin film

About thin film

, 
calorimetry

About calorimetry

, 
refractive index

About refractive index

, 
experimental design

About experimental design

, 
*characterization

About characterization

, 
energy dissipation

About energy dissipation

, 
substrate temperature

About substrate temperature

, 
focused ion beam

About focused ion beam

, 
X-ray

About X-ray

, 
*plasma CVD

About plasma CVD

, 
chemical vapor deposition

About chemical vapor deposition

, 
process parameter

About process parameter


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
成長条件

About 成長条件

, 
チャンバ

About チャンバ

, 【Automatic Indexing@JST】
Author keywords (4)：
thin films

About thin films

, 
plasma enhanced chemical vapor deposition

About plasma enhanced chemical vapor deposition

, 
SiO_2

About SiO_2

, 
compactness

About compactness

JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
PECVD

About PECVD

, 
薄膜

About 薄膜

, 
緻密性

About 緻密性

, 
特性化

About 特性化


Return to Previous Page

TOP

BOTTOM