T. Kimoto, M. Kaneko, K. Tachiki, K. Ito, K. Mikami, H. Fujii, A. Inoue, N. Maeda. An Overview of SiC High-Voltage Power Devices and High-Temperature ICs. 2024 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS). 2024. 88-94
Shota Kozakai, Haruki Fujii, Mitsuaki Kaneko, Tsunenobu Kimoto. Depth profiles of electron and hole traps generated by reactive ion etching near the surface of 4H-SiC. Journal of Applied Physics. 2024. 136. 9. 095702-095702
Shion Toshimitsu, Keita Tachiki, Mitsuaki Kaneko, Tsunenobu Kimoto. Demonstration of SiC n-channel MOSFETs fabricated on a high-purity semi-insulating substrate and investigation of the short-channel effects. Japanese Journal of Applied Physics. 2024. 63. 9. 090905-090905
Ryoya Ishikawa, Mitsuaki Kaneko, Tsunenobu Kimoto. Estimation of Electron Drift Mobility along the <i>c</i>-Axis in 4H-SiC by Using Vertical Schottky Barrier Diodes. Solid State Phenomena. 2024. 360. 205-210
SiC High-Voltage Power Devices and High-Temperature Ics
(2024 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium 2024)
Tunneling Phenomena and Ohmic Contact Formation at Non-Alloyed Metal/Heavily-Doped SiC Interfaces
(Pacific Rim Meeting of Electrochemical and Solid State Science 2024 2024)
Impacts of Anisotropic Material Properties on Performance of SiC Power Devices
(Pacific Rim Meeting of Electrochemical and Solid State Science 2024 2024)
Doping-dependent fixed charges in SiC MOSFETs
(21st International Conference on Silicon Carbide and Related Materials (ICSCRM2024) 2024)
Mobility enhancement in SiC n- and p-channel MOSFETs
(21st International Conference on Silicon Carbide and Related Materials (ICSCRM2024) 2024)
2024/10 - ICSCRM2024 program comittee The John Palmour Best Student Paper Award Doping-dependent fixed charges in SiC MOSFETs
2023/10 - IEEE EDS Kansai Chapter The 23rd IEEE EDS Kansai Chapter of the Year Award SiC Complementary Junction Field-Effect Transistor Logic Gate Operation at 623 K,” IEEE Electron Device Lett., 43, 997 (2022)
2023/09 - ICSCRM2023 program comittee The John Palmour Best Student Paper Award Depth profiles of deep levels in the whole band gap generated by reactive ion etching near the surface of 4H-SiC