Rchr
J-GLOBAL ID：200901052389763576
Update date: Aug. 21, 2022
Sasaki Katsutaka
ササキ カツタカ | Sasaki Katsutaka
Affiliation and department：
Job title：
Professor Emeritus(describe the name of university in title)
Research field (2)：
Electric/electronic material engineering
, Thin-film surfaces and interfaces
Research keywords (4)：
薄膜物性工学
, 電子材料
, Material Science of Thin Solid Films
, Electronic Material
Research theme for competitive and other funds (6)：
MISC (293)：
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Yoshio Abe, Hideaki Ueta, Takeshi Obata, Midon Kawamura, Katsutaka Sasaki, Hidenobu Itoh. Effects of Sputtering Gas Pressure on Electrochromic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere. JAPANESE JOURNAL OF APPLIED PHYSICS. 2010. 49. 11. 115802-1-115802-4
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Yoshio Abe, Hideaki Ueta, Takeshi Obata, Midon Kawamura, Katsutaka Sasaki, Hidenobu Itoh. Effects of Sputtering Gas Pressure on Electrochromic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere. JAPANESE JOURNAL OF APPLIED PHYSICS. 2010. 49. 11. 115802-1-115802-4
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Hidefumi Kimizaki, Satoko Shinkai, Katsutaka Sasaki, Hideto Yanagisawa, Misao Yamane, Yoshio Abe. Dielectric Properties of Zr-Al Anodized Thin Film Capacitors Prepared Using Al-Doped Zr Alloy Films. JAPANESE JOURNAL OF APPLIED PHYSICS. 2010. 49. 10. 10501-1-10501-5
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Hidefumi Kimizaki, Satoko Shinkai, Katsutaka Sasaki, Hideto Yanagisawa, Misao Yamane, Yoshio Abe. Dielectric Properties of Zr-Al Anodized Thin Film Capacitors Prepared Using Al-Doped Zr Alloy Films. JAPANESE JOURNAL OF APPLIED PHYSICS. 2010. 49. 10. 10501-1-10501-5
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Midori Kawamura, Terumasa Fudei, Yoshio Abe, Katsutaka Sasaki. Improved Thermal Stability of Ag Thin Films by Organic Subnanolayer at Interface with Silicon Oxide Layer. JAPANESE JOURNAL OF APPLIED PHYSICS. 2009. 48. 11. 118002
ｍore...
Books (5)：
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透明導電膜
シーエムシー出版 2005 ISBN:4882318601
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Trasparent Conductive Films
CMC Corporation 2005 ISBN:4882318601
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透明導電膜の新展開 第9章 TiN薄膜〜透明導電膜への適用可能〜
(株)シーエムシー 1999
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Developments of Trasparent Conductive Films: Chapter 9: TiN Thin Film〜Applicability to Transparent Conductive Film〜
CMC Corporation 1999
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Developments of Trasparent Conductive Films: Chapter 9: TiN Thin Film〜Applicability to Transparent Conductive Film〜
CMC Corporation
Works (3)：
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Hafnium nitride as an intermediate layer for growth of gallium nitride on silicon
2002 -
-
遷移金属/Si系における界面反応の電顕観察
1996 -
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TEM observation of interfacial reaction of transition metal/Si system
1996 -
Education (2)：
- - 1967 Hokkaido University School of Science
- - 1967 Hokkaido University Faculty of Science Department of Polymer Science
Professional career (1)：
- (BLANK) (Hokkaido University)
Work history (6)：
- 1979 - 1990 Kitami Institute of Technology
- 1979 - 1990 Kitami Institute of Technology, Associate Professor
- 1990 - - 北見工業大学 教授
- 1990 - - Kitami Institute of Technology, Professor
- 1975 - 1979 Kitami Institute of Technology
- 1975 - 1979 Kitami Institute of Technology, Lecturer
Show all
Association Membership(s) (3)：
日本化学会
, 応用物理学会
, 電子情報通信学会
