Rchr
J-GLOBAL ID:200901063261014173   Update date: Nov. 05, 2024

Hamaguchi Satoshi

ハマグチ サトシ | Hamaguchi Satoshi
Affiliation and department:
Job title: Professor
Homepage URL  (1): http://www.camt.eng.osaka-u.ac.jp/hamaguchi/
Research field  (3): Nuclear fusion ,  Applied plasma science ,  Basic plasma science
Research keywords  (3): numerical simulation ,  plasma chemistry ,  plasma physics
Research theme for competitive and other funds  (30):
  • 2023 - 2025 Plasma-surface interaction in plasma-enhanced atomic-layer deposition of two-dimensional materials
  • 2021 - 2025 Nonequilibrium surface reactions of plasma-assisted atomic layer processes
  • 2018 - 2020 Establishment of Principles for Machine-Learning Assisted Analysis of Plasma Surface Reactions
  • 2015 - 2020 Quantum Theoretical Analyses of Plasma Processing for Novel and Diverse Materials Using Multi-Scale Numerical Simulations
  • 2015 - 2018 大気圧プラズマによるバイオ表面制御機構の多階層シミュレーション解析
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Papers (512):
  • Zoltán Donkó, Tsanko V Tsankov, Peter Hartmann, Fatima Jenina Arellano, Uwe Czarnetzki, Satoshi Hamaguchi. Self-consistent calculation of the optical emission spectrum of an argon capacitively coupled plasma based on the coupling of particle simulation with a collisional-radiative model. Journal of Physics D: Applied Physics. 2024
  • Jomar U. Tercero, Michiro Isobe, Kazuhiro Karahashi, Magdaleno R. Vasquez, Jr., Satoshi Hamaguchi. Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study. Journal of Vacuum Science & Technology A. 2024
  • Anjar Anggraini Harumningtyas, Tomoko Ito, Hidekazu Kita, Joe Kodama, Takashi Kaito, Satoshi Hamaguchi. Amine plasma polymers deposited on porous hydroxyapatite artificial bone with bipolar pulsed discharges. Journal of Vacuum Science & Technology A. 2024. 42. 5
  • Fatima Jenina Arellano, Minoru Kusaba, Stephen Wu, Ryo Yoshida, Zoltán Donkó, Peter Hartmann, Tsanko V. Tsankov, Satoshi Hamaguchi. Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra. Journal of Vacuum Science & Technology A. 2024. 42. 5
  • Jomar U. Tercero, Michiro Isobe, Kazuhiro Karahashi, Satoshi Hamaguchi. Molecular dynamics simulations of silicon nitride atomic layer etching with Ar, Kr, and Xe ion irradiations. Japanese Journal of Applied Physics. 2024
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MISC (218):
  • 生田 雅人, Harumningtyas Anjar Anggraini, 伊藤 智子, 北原 貴之, 古市 拓也, 文 勝徹, 平井 宏昌, 蟹江 祐哉, 古家 雅之, 藤森 孝人, et al. マグネトロンスパッタリングを用いたPEEK表面チタン酸ストロンチウム修飾の骨形成効果. 日本バイオマテリアル学会大会予稿集. 2023. 45回. 397-397
  • 浜口 智志. Why are physical sputtering yields similar for incident ions with different masses??physical sputtering yields of the Lennard-Jones system. Journal of Physics D: Applied Physics. 2022. 55. 225209-225209
  • 唐橋一浩, 伊藤智子, 浜口智志. Experimental and theoretical approaches for the study of etching surface reactions. 応用物理. 2022. 91. 3. 164-168
  • Abdulrahman H. Basher, Marjan Krstic, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi. Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)(2) on a nickel oxide surface in atomic layer etching processes (vol 38, 052602, 2020). JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2021. 39. 5
  • Kang Hojun, Ito Tomoko, Um Junghwan, Kokura Hikaru, Kang Taekyun, Cho Sung-Il, Park Hyunjung, Karahashi Kazuhiro, Hamaguchi Satoshi. Surface reactions of fluorinated Y2O3 by H+ and O+ ion irradiation. JSAP Annual Meetings Extended Abstracts. 2021. 2021.1. 1465-1465
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Patents (40):
Books (12):
  • プラズマプロセスの基礎と素過程」 浜口智志: 第25回プラズマエレクトロニクス講習会テキスト
    (公社)応用物理学会プラズマエレクトロニクス分科会 2014
  • プラズマ原子分子過程ハンドブック
    大阪大学出版会 2011 ISBN:4872593626
  • プラズマ原子分子過程ハンドブック
    大阪大学出版会 2011 ISBN:9784872593624
  • 「プラズマエッチング表面反応シミュレーション」 “ドライ・ウエットエッチング技術全集”
    技術情報協会 2009
  • 「プラズマフォトニクス」“光とナノが創る科学と産業”
    株式会社アドスリー 2009
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Education (3):
  • 1984 - 1988 New York University Graduate School of Arts and Science Department of Mathematics
  • 1982 - 1987 The University of Tokyo Graduate School of Science Department of Physics
  • 1978 - 1982 The University of Tokyo Faculty of Science Department of Physics
Professional career (2):
  • D. Sci. (The University of Tokyo)
  • Ph.D. (New York University)
Committee career (17):
  • 2020/01 - 現在 25th International Symposium on Plasma Chemistry (ISPC25) Co-Chair, Program Committee
  • 2020/01 - 現在 25th International Symposium on Plasma Chemistry (ISPC25) Co-Chair, Local Organizing Committee
  • 2019/12 - 現在 Plasma Medicine (Begell House Publishing) Editor-in-Chief
  • 2019/01 - 現在 12th EU-Japan Joint Symposium on Plasma Processing (JSPP-11) Co-Chair, Organizing Committee,
  • 2019/01 - 現在 3nd International Conference on Data-Driven Plasma Science (ICDDPS) Co-Chair, Executive Scientific Committee,
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Awards (9):
  • 2022/09 - The Japan Society of Applied Physics (JSAP) The Japan Society of Applied Physics (JSAP) Fellow For His Seminal Work on Nonlinear Plasma Physics and Plasma-Surface Interactions
  • 2022/01 - Plasma Science for Materials,. JSPS 153 Committee Plasma Material Science Award Research on semiconductor plasma processing and plasma medicine mostly combined with computational science
  • 2019/09 - German Research Foundation Mercator Fellow
  • 2019/09 - Japan Society of Applied Physics The 41st JSAP Outstating Paper Award,
  • 2016/11 - American Vacuum Society Plasma Prize
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