2008 - 2010 Research on Large-Scaled Line Plasma Production by Microwave
2006 - 2007 A Study on a New Method to Measure Electron Energy Distribution in High Frequency Plasmas
2006 - 2007 Crystal with Metal-Insulator Transition by Plasma Processing Technique and Its Application to Switching Devices
2004 - 2005 The study of control of "partial" detached plasma and heat transport
2004 - 2005 Study on the Epitaxial Growth of Oxide Films in Sputtering focusing on Negative Oxygen Ion Behavior
2000 - 2005 酸素負イオンによるシリコントレンチ酸化
2000 - 2005 Silicon Trench Oxidation by Oxygen Negative Ion
2005 - 大規模マイクロ波ラインプラズマ生成技術の研究
2000 - 2004 大口径プラズマ生成技術と集積回路プロセスの研究
2000 - 2004 Study on Large Diameter Plasma Prodution and ULSI Process
1999 - 2003 Study on Plasma Diagnostic System
1998 - 2003 負イオンプラズマによるシリコンエッチングの研究
1998 - 2003 Study on Si Etching in Negative Ion Plasma
1999 - 2000 Negative Ion Silicon Oxidation in Oxygen Plasma with High Rate and Low Damage.
1994 - 1994 電子サイクロトン分数波共鳴プラズマの生成とスパンタ応用
1991 - 1993 Investigation and control of a directional atomic flow induced by a high density electron current in an ultra fine metalic interconnection
1987 - 1988 High Speed Driving Operation in Surface-Discharge AC Plasma Display Panels
プラズマ診断システムとモニター装置の研究
容量結合プラズマの電子エネルギー分布測定技術
酸素負イオンによる酸化膜形成技術
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Papers (28)：
Hiroshi Kuwahata, Hiroshi Miyata, Masao Isomura, Haruo Shindo. Generation of microwave-excited atmospheric-pressure line plasma and its application. JAPANESE JOURNAL OF APPLIED PHYSICS. 2017. 56. 12
Yuki Ishii, Tetsuya Kaneko, Kunio Okimura, Haruo Shindo, Masao Isomura. Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma. THIN SOLID FILMS. 2017. 624. 49-53
Isomura Masao, Yamada Toshinori, Osuga Kosuke, Shindo Haruo. Reduction in plasma potential by applying negative DC cathode bias in RF magnetron sputtering. Jpn. J. Appl. Phys. 2016. 55. 11. 116201-116201
Yasuyuki Taniuchi, Toshinori Yamada, Takanori Tokieda, Michiaki Utsumi, Masao Isomura, Haruo Shindo. A New Floating-Probe for Measurement of Insulated Plasma Produced by Radio-Frequency Power. JAPANESE JOURNAL OF APPLIED PHYSICS. 2012. 51. 11
K Fujiwara, H Shindo. In situ measurements of etching species in SF6 microwave downstream plasma by ion attachment mass spectroscopy. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2004. 43. 8A. 5540-5544
A New Diagnostic Tool of Radio-Frequency Etching Plasma Produced in Insulated Vessels. 55th International Symposium of American Vacuum Society, PS1-ThA10. 2008. 140
