Rchr
J-GLOBAL ID：201401028945853328   Update date: Oct. 04, 2024

URABE Keiichiro

ウラベ ケイイチロウ | URABE Keiichiro
Affiliation and department：
Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics

About Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics


Job title： Associate Professor
Homepage URL  (2)： http://www.propulsion.kuaero.kyoto-u.ac.jp/Member:Urabe ,  http://www.propulsion.kuaero.kyoto-u.ac.jp/w/index.php?title=Top&setlang=en
Research field  (7)： Basic plasma science ,  Thin-film surfaces and interfaces ,  Basic plasma science ,  Applied plasma science ,  Chemical reaction and process system engineering ,  Electric/electronic material engineering ,  Aerospace engineering
Research keywords  (13)： Space Electric Propulsion ,  Etching ,  Thin Film Deposition ,  Plasma Processing ,  Cryoplasma ,  Supercritical Fluid plasma ,  Atmospheric Pressure Plasma ,  Plasma Science ,  Plasma Diagnostics ,  Plasma Application ,  Plasma ,  Laser Spectroscopy ,  Microplasma
Research theme for competitive and other funds  (13)：
  • 2024 - Diagnostics of plasma-material interaction by harmonic spectroscopy method
  • 2024 - Super-selective and local supply of short-lived reactive species by advanced plasma control
  • 2022 - 2023 Harmonic impedance spectroscopy and its application to surface monitoring
  • 2021 - 2022 3D visualization of excited species in plasmas by optical pumping method
  • 2020 - 2022 Stabilization of dispersion interferometer utilizing gas reflactive-index dispersion
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Papers (59)：
  • Takahiro Goya, Keiichiro Urabe, Koji Eriguchi. Optical and electrical evaluation methods of plasma-induced damage in InP substrates. JAPANESE JOURNAL OF APPLIED PHYSICS. 2024. 63. 6. 06SP04
  • Ryosuke Takahashi, Seiya Kito, Koji Eriguchi, Keiichiro Urabe. Time-resolved laser-induced fluorescence spectroscopy using CW diode laser for diagnostics of argon-ion velocity distribution near AC-biased electrode. REVIEW OF SCIENTIFIC INSTRUMENTS. 2024. 95. 5. 053506
  • Keiichiro Urabe, Minami Toyoda, Yoshinori Matsuoka, Koji Eriguchi. Investigation of small-fraction molecular impurities in high-pressure helium plasmas using optical plasma diagnostic methods. PLASMA SOURCES SCIENCE AND TECHNOLOGY. 2024. 33. 2. 025011
  • Junki Morozumi, Takahiro Goya, Tomohiro Kuyama, Koji Eriguchi, Keiichiro Urabe. In situ electrical monitoring of SiO2/Si structures in low-temperature plasma using impedance spectroscopy. JAPANESE JOURNAL OF APPLIED PHYSICS. 2023. 62. SI. SI1010
  • Yoshihiro Sato, Satoshi Shibata, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami, Keiichiro Urabe, Koji Eriguchi. Predicting the effects of plasma-induced damage on p-n junction leakage and its application in the characterization of defect distribution. JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B. 2022. 40. 6. 062209
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MISC (5)：
Patents (5)：
  • Chemistries for etching multi-stacked layers
  • Etching method and plasma etching material
  • Method and material for pore filling inside porous films
  • Method to etch porous film
  • Method to etch porous film
Books (2)：
  • Applications of Laser Ablation - Thin Film Deposition, Nanomaterial Synthesis and Surface Modification
    IntechOpen Ltd 2016 ISBN:9789535128120
  • CO2 Laser - Optimisation and Application
    IntechOpen Ltd 2012 ISBN:9789535103516
Lectures and oral presentations  (42)：
  • Study on surface erosion of ion engine utilizing micro- and nano-meter scale structures
    (2024 First Conference 2024)
  • Diagnostics of Electron Sheath on a Metal Plate in a Low-Pressure Plasma Using Laser-Induced Fluorescence Spectroscopy
    (The 71st JSAP Spring Meeting 2024)
  • Diagnostics of Ion Shearth on an AC-Biased Metal Plate Using Time-Resolved Laser-Induced Fluorescence Spectroscopy (II)
    (The 71st JSAP Spring Meeting 2024)
  • Study of molecular-impurity decomposition in high-pressure helium dielectric barrier discharge generated in a closed glass cell
    (The 41st Symposium on Plasma Processing 2024)
  • 準安定励起ヘリウム原子を用いた光ポンピング磁気センサの磁場感受性についての検討
    (マグネティックス/マイクロマシン・センサシステム/バイオ・マイクロシステム 合同研究会 2023)
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Education (2)：
  • 2007 - 2012 Kyoto University Graduate School of Engineering Department of Electronic Science and Engineering
  • 2002 - 2007 Kyoto University Faculty of Engineering School of Electric and Electronic Engineering
Professional career (1)：
  • Ph.D. (Kyoto University)
Work history (7)：
  • 2024 - 現在 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics Associate Professor
  • 2018 - 2024 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics Assisant Professor
  • 2015 - 2018 Air Liquide Laboratories Researcher
  • 2012 - 2014 Japan Society for the Promotion of Science Research Fellow (PD)
  • 2012 - 2014 The University of Tokyo Department of Advanced Materials Science Research Fellow
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Committee career (16)：
  • 2024 - 現在 応用物理学会 シリコンテクノロジー分科会 幹事(ナノ・マイクロファブリケーション研究委員会)
  • 2023 - 現在 The Institute of Electrical Engineers of Japan Investigating R&D Committee: Diagnostics of discharge, plasma, and pulse power
  • 2022 - 現在 Japan Society of Applied Physics Chair of Plasma Wakate (Young Resarchers) Champter
  • 2020 - 2024 日本表面真空学会 関西支部 庶務幹事
  • 2022 - 2023 The 25th International Symposium on Plasma Chemistry (ISPC25) Local Organizing Committee
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Awards (8)：
  • 2021 - Plasma Electronics Division, The Japan Society of Applied Physics 19th Plasma Electronics Award
  • 2018 - HORIBA Masao Horiba Awards 2018
  • 2014 - ISPlasma 2014 / IC-PLANTS 2014 Best Presentation Award (Oral in Plasma Science)
  • 2013 - MRS-J Award for Encouragement of Research in Materials Science
  • 2013 - 16th International Symposium on Laser-Aided Plasma Diagnostics Prize for the Best Combination of Pre-Poster Talk and Poster Presentation
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Association Membership(s) (6)：
Silicon Technology Division, The Japan Society of Applied Physics ,  The Japan Society of Plasma Science and Nuclear Fusion Research ,  The Japan Society of Vacuum and Surface Science ,  The Japan Society for Aeronautical and Space Sciences ,  Division of Plasma Electronics, The Japan Society of Applied Physics ,  The Japan Society of Applied Physics
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