Rchr
J-GLOBAL ID:200901026058539144   Update date: Jul. 09, 2022

Ishikawa Hiromi

イシカワ ヒロミ | Ishikawa Hiromi
Affiliation and department:
Research field  (1): Material fabrication and microstructure control
Research theme for competitive and other funds  (3):
  • 1997 - 2001 イオンプレーティング法による窒化珪素膜の特性
  • イオンプレーティング法によるジルコニア薄膜の特性
  • Characteristics of silicon nitride films by the ion plating method
MISC (4):
Professional career (1):
  • 工学博士 (千葉大学)
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