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J-GLOBAL ID：200901032847091743   Update date: Feb. 14, 2023

Muta Hiroshi

ムタ ヒロシ | Muta Hiroshi
Affiliation and department：
Kindai University Faculty of Humanity-Oriented Science and Engineering

About Kindai University Faculty of Humanity-Oriented Science and Engineering


Job title： Professor
Research field  (1)： Applied plasma science
Research keywords  (6)： Ultrafast DLC deposition ,  Numerical Simulation of Electromagnetic Fields ,  VHF Plasma ,  Thin-film Silicon Solar Cell ,  Plasma CVD ,  ECR Plasma
Research theme for competitive and other funds  (5)：
  • 2013 - 2016 超音速噴流を用いたVHFプラズマによる高速大面積微結晶シリコン製膜法の開発
  • 2008 - 2011 狭ギャップ高圧VHFプラズマを用いた微結晶シリコン薄膜作製
  • 2007 - 2010 中性粒子風と渦の極性反転
  • 2002 - 2003 低温プラズマ表面修飾技術による酸化チタン微粒子の環境浄化機能の改善に関する研究
  • 1998 - 2000 ECRプラズマ中の電子速度分布関数と成膜の再現性に関する研究
Papers (64)：
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MISC (8)：
  • Nodo Ryo, Matsunaga Takuma, Iseki Masahito, Muta Hiroshi, Nishida Satoshi, Kuribayashi Shizuma. B132 Experimental research of the degree of Si crystallinity controlling method in the non-equilibrium plasma jet CVD. Procee[d]ings of Thermal Engineering Conference. 2013. 2013. 57-58
  • Matsuoka Kazuki, Okamoto Naoki, Ando Daisuke, Nakamura Jiro, Nishida Satoshi, Muta Hiroshi, Kuribayashi Shizuma. G212 Influence of gas flow rate on Si deposition rate by non-equilibrium plasma CVD. Procee[d]ings of Thermal Engineering Conference. 2012. 2012. 435-436
  • ANDO Daisuke, NAKAMURA Jiro, TSUNEKAWA Yoshihiro, NISHIDA Satoshi, MUTA Hiroshi, KURIBAYASHI Shizuma, TAKEUCHI Yoshiaki, YAMAUCHI Yoshihiro, TAKATSUKA Hiromu. Using a Supersonic Under-Expanded Jet α/μc-Si:H Deposition by Non-equilibrium VHF Plasma Enhanced CVD. 2010. 2010. 48. 5-10
  • MIZUNO Kenta, MATSUOKA Masanori, MUTA Hiroshi, NISHIDA Satoshi, KURIBAYASHI Shizuma, TAKEUCHI Yoshiaki, YAMAUCHI Yasuhiro, TAKATSUKA Hiromu. Characteristics of VHF Plasma Produced by a Balanced Power Feeding Method. 2010. 2010. 48. 29-32
  • M Noguchi, T Hirao, M Shindo, K Sakurauchi, Y Yamagata, K Uchino, Y Kawai, K Muraoka. Comparative studies of the laser Thomson scattering and Langmuir probe methods for measurements of negative ion density in a glow discharge plasma. PLASMA SOURCES SCIENCE & TECHNOLOGY. 2003. 12. 3. 403-406
ｍore...
Books (1)：
  • プラズマCVDにおける成膜条件の最適化に向けた反応機構の理解とプロセス制御・成膜事例
    サイエンス&テクノロジー 2018
Professional career (1)：
  • Doctor of Engineering (Kyushu University)
Work history (1)：
  • 2015/04 - 現在 Kinki University, Human-oriented Engineering Professor
Committee career (1)：
  • 2002 - プラズマ・核融合学会 広報委員
Awards (1)：
  • 1986 - 電気関係学会九州支部連合大会発表賞
Association Membership(s) (3)：
電気学会 ,  プラズマ・核融合学会 ,  応用物理学会
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