Rchr
J-GLOBAL ID:200901061397744482
Update date: Jun. 06, 2020
Ando Atsushi
アンドウ アツシ | Ando Atsushi
Affiliation and department:
National Institute of Advanced Industrial Science and Technology
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Homepage URL (1):
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=A46264765
MISC (11):
T Oohira, A Ando. Monitoring conditions of cantilever during conducting atomic force microscopy spectroscopy measurements. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2006. 45. 3B. 1934-1936
Y Naitou, A Ando, H Ogiso, S Kamiyama, Y Nara, K Nakamura, H Watanabe, K Yasutake. Spatial fluctuation of dielectric properties in Hf-based high-k gate films studied by scanning capacitance microscopy. APPLIED PHYSICS LETTERS. 2005. 87. 25. 252908-1-252908-3
T Shimizu, H Abe, A Ando, H Tokumoto. Electric transport measurement of a multi-walled carbon nanotube in scanning transmission electron microscope. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. 2004. 24. 1-2. 37-41
XP Zou, H Abe, T Shimizu, A Ando, Y Nakayama, H Tokumoto, SM Zhu, HS Zhou. Simple thermal chemical vapor deposition synthesis and electrical property of multi-walled carbon nanotubes. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. 2004. 24. 1-2. 14-18
A Ando, T Shimizu, H Abe, Y Nakayama, H Tokumoto. Improvement of electrical contact at carbon nanotube/Pt by selective electron irradiation. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. 2004. 24. 1-2. 6-9
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Association Membership(s) (2):
電子通信情報学会
, 応用物理学会
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