Rchr
J-GLOBAL ID：200901091264571018   Update date: Aug. 20, 2024

Tanaka Takeshi

タナカ タケシ | Tanaka Takeshi
Affiliation and department：
Hiroshima Institute of Technology Faculty of Engineering, Department of Electronics and Computer Engineering

About Hiroshima Institute of Technology Faculty of Engineering, Department of Electronics and Computer Engineering


Job title： Professor
Homepage URL  (1)： http://www.it-hiroshima.ac.jp/faculty/engineering/electronics/teacher/tanaka_takeshi/
Research field  (3)： Inorganic materials ,  Electronic devices and equipment ,  Electric/electronic material engineering
Research keywords  (6)： 無機材料・物性 ,  電子デバイス・機器工学 ,  電子・電気材料工学 ,  Inorganic Material and Properties ,  Electron device and Machineries Engineering ,  Electronic and Electrical Material Engineering
Research theme for competitive and other funds  (16)：
  • 2022 - 2025 Study on application of HHO gas in food sterilization using plasma-based ion implantation
  • 2021 - 2024 Elucidation of Japanese fillers : Using Optical Topography to Analyze Language and Sentiment
  • 2019 - 2023 複合ガスを用いたプラズマベースイオン注入法による高効率食品殺菌技術の開発
  • 2016 - 2019 Development of food sterilization method by plasma-based ion implantation
  • 簡単なアナログ、デジタル集積回路の試作および設計教育
Show all
Papers (4)：
  • K Vutova, G Mladenov, T Tanaka, K Kawabata. Simulation of the energy absorption and the resist development at sub-150 nm ion lithography. MICROELECTRONIC ENGINEERING. 2005. 78-79. 533-539
  • HARADA Masahiro, KAWAI Katuhiro, TANAKA Takeshi, KAWABATA Keishi, KAJIOKA Hideshi. Dependence of Sputtering Gas Pressure on the Properties for Fe Thin Films using RF Magnetron Sputtering with Multipolar Magnetic Plasma Confinement. Journal of the Vacuum Society of Japan. 2003. 46. 3. 241-244
  • T Tanaka, M Suzuki, K Kawabata. Effect of DC bias on the deposition rate using RF-DC coupled magnetron sputtering for Mg thin films. THIN SOLID FILMS. 1999. 343. 57-59
  • T TANAKA, K KAWABATA. EFFECT OF DEPOSITION RATE ON DC BIAS VOLTAGE BY USING RF-DC COUPLED MAGNETRON SPUTTERING. FOURTH INTERNATIONAL CONFERENCE ON ELECTRON BEAM TECHNOLOGIES - EBT '94. 1994. 238-242
MISC (97)：
ｍore...
Books (12)：
  • XPS profilography through angle resolved spectra(共著)
    Abstracts of ELECTRONICA 1998
  • Textured surface analysis by x-ray photoelectron spectroscopy(共著)
    Abstracts of ELECTRONICA 1998
  • 電子デバイス-物性からICまで-
    産業図書株式会社 1997
  • Stoichiometry control in r. f-d. c. coupled magnetron sputtering of AlNx(共著)
    Proc. 5th Int. Conf. on Electron Beam Technologies 1997
  • X-ray Photoelectron Spectroscopy Measurements of TiNx Films and Ti Target Surface Nitrided by r. f. -d. c. Coupled Reactive Magnetron Sputtering(共著)
    Proc. 5th Int. Conf. on Electron Beam Technologies 1997
ｍore...
Works (6)：
  • 金属薄膜および透明導電膜評価に関する研究
    1990 - 2001
  • 太陽電池式LED発光型標識システム
    2000 -
  • Road traffic sign system using LED emission with solar cell.
    2000 -
  • X線光電子分光スペクトル解析
    1999 -
  • Analysis of X-ray photoelectron spectra
    1999 -
ｍore...
Professional career (2)：
  • Master of Engineering (Hiroshima University)
  • Doctor of Engineering (Hiroshima University)
Work history (2)：
  • 2010/10 - 現在 教授
  • 2012/04 - 2016/03 Hiroshima Institute of Technology
Committee career (1)：
  • 1999 - 2000 電子情報通信学会 中国支部 学生会 顧問
Association Membership(s) (5)：
THE ILLUMINATING ENGINEERING INSTITUTE OF JAPAN ,  IEEE ,  日本真空協会 ,  電子情報通信学会 ,  応用物理学会
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