High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement.

KAWABATA K; TANAKA T; KITABATAKE A; YAMADA K; MIKAMI Y; KAJIOKA H; TOIYAMA K

Art

J-GLOBAL ID：200902159570794222 Reference number：01A0793049

High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement.

多極磁気プラズマ閉込めを用いたrf-dc結合マグネトロンスパッタリングによるNi膜の高速スパッタリング

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Author (7)： , , , , , ,
Material：
Volume： 19 Issue： 4,Pt.1 Page： 1438-1441 Publication year： Jul. 2001
JST Material Number： C0789B ISSN： 0734-2101 CODEN： JVTAD6 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Metallic thin films , Techniques and equipment of thin film deposition

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