Rchr
J-GLOBAL ID:200901093715375334
Update date: Sep. 28, 2022
Kawabata Keishi
カワバタ ケイシ | Kawabata Keishi
Affiliation and department:
Homepage URL (1):
http://ttl.cc.it-hiroshima.ac.jp
Research field (3):
Inorganic materials
, Electronic devices and equipment
, Electric/electronic material engineering
Research keywords (6):
無機材料・物性
, 電子デバイス・機器工学
, 電子・電気材料工学
, Inorganic Material and Properties
, Electron Devices and Machineries Engineering
, Electronic and Electrical Materisl Engineering
Research theme for competitive and other funds (10):
- X線光電子分光法による薄膜評価
- スパッタリングによる薄膜形成技術
- 多重磁極マグネトロンスパッタ装置の開発
- 高融点金属のスパッタリングに関する研究
- 薄膜形成技術に関する研究
- Characterization for thin films by XPS
- Fabrication technology for thin films by sputtering
- Development of magnetron sputtering system with multi-potar magnets
- Study on refractory metal films by sputtering
- Study on fabrication technology for thin films
Show all
MISC (69):
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S Honda, T Shimizu, T Une, M Sakamoto, K Kawabata, T Tanaka. X-ray photoelectron spectroscopy and magnetic properties in Fe-SiO2 granular films. JOURNAL OF APPLIED PHYSICS. 2003. 94. 7. 4279-4284
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S Honda, T Shimizu, T Une, M Sakamoto, K Kawabata, T Tanaka. X-ray photoelectron spectroscopy and magnetic properties in Fe-SiO2 granular films. JOURNAL OF APPLIED PHYSICS. 2003. 94. 7. 4279-4284
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Control of properties of thin films prepared by yf-dc coupled magnetron sputtering. Recent Res. Devel. Vacuum Sci. and Tech. 2003. 4. 191-212
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宮本 嗣久, 大西 学, 熊渕 善太, 山縣 悠, 川畑 敬志, 梶岡 秀. 高周波-直流結合型マグネトロンスパッタ法におけるAr+及びCu+イオンのエネルギー分布(共著). 真空. 2003. 46. 3. 245-248
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原田 昌浩, 河合 克浩, 田中 武, 川畑 敬志, 梶岡 秀. 多重磁極形マグネトロンスパッタ法によるFe薄膜のスパッタガス圧力依存性(共著). 真空. 2003. 46. 3. 241-244
more...
Patents (3):
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高機能表面処理Mg系金属とその製造方法
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多重磁極マグネトロンスパッタ法
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マグネトロンスパッタ法
Books (9):
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Effect of d.c. bias on the deposition rate using r.f.-d.c. coupled magnetron sputtering for SnNx thin films (共著)
Proc. 5th. Int. Symposium on sputtering and processes 1999
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XPS profilography through angle resolved spectra(共著)
Abstracts of ELECTRONICA 1998
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Textured surface analysis by x-ray photoelectron Spectroscopy(共著)
Abstracts of ELECTRONICA 1998
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電子デバイス-物性からICまで-(共著)
産業図書 1997
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Stoichiometry control in r. f. -d. c. Coupled magnetron Sputtering of A(]G0131[)N<sub>x</sub>(共著)
Proc. 5th. Int. Conf. on Electron Beam Technogies 1997
more...
Works (6):
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多重磁極マグネトロンスパッタ装置の開発
2001 -
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Development of magnetron sputtering system with multipolar magnets
2001 -
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透明導電膜の表面改質
1992 - 1993
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Surface Improvement of transparent conductive oxide films
1992 - 1993
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スパッタリング薄膜の評価
1990 -
more...
Education (2):
- - 1967 Hiroshima Institute of Technology Faculty of Engineering
- - 1967 Hiroshima Institute of Technology Faculty of Engineering
Professional career (1):
- Doctor in Engineering (Hiroshima University)
Work history (10):
- 1981 - 1991 Hiroshima Institute of Technology
- 1981 - 1991 Hiroshima Institute of Technology, Assistant
- 1991 - - 広島工業大学 教授
- 1991 - - Hiroshima Institute of Technology, Professor
- 1971 - 1981 Hiroshima Institute of Technology
- 1971 - 1981 Hiroshima Institute of Technology, Lecture
- 1967 - 1971 Hiroshima Institute of Technology
- 1967 - 1971 Hiroshima Institute of Technology, Research
- Professor
- Assistant
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Committee career (2):
- 2003 - 応用物理学会中国四国支部 幹事
- 1998 - 電子情報通信学会中国支部 評議委員
Association Membership(s) (6):
応用物理学会中国四国支部
, 電子情報通信学会中国支部
, American Vacuum Society
, 米国電気電子学会(IEEE:THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS,INC.)
, 電子情報通信学会
, 応用物理学会
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