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J-GLOBAL ID:200902232796023732   Reference number:03A0329366

Energy Distribution of Ar+ Ions and Cu+ Ions by an rf-dc Coupled Magnetron Sputtering System

高周波-直流結合形マグネトロンスパッタ法におけるAr+及びCu+イオンのエネルギー分布
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Volume: 46  Issue:Page: 245-248  Publication year: Mar. 20, 2003 
JST Material Number: G0194A  ISSN: 0559-8516  CODEN: SHINA  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Metallic thin films 
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