Rchr

J-GLOBAL ID：200901095368734232 Update date: Apr. 30, 2020

Miyake Shoji

ミヤケショウジ | Miyake Shoji

Affiliation and department：

Research field (4)： Material fabrication and microstructure control , Applied physics - general , Basic plasma science , Applied plasma science

Research keywords (6)：電磁波材料プロセス , プラズマプロセシング , イオンビームプロセス , EMW Materials Processing , Plasma Processing , Ion Beam Process

Research theme for competitive and other funds (6)：

電磁波による材料プロセスの研究
イオンビームプロセスの研究
プラズマプロセシングの研究
Study on Materials Processing by Electromagnetic Radiation
Study on Ion Beam Process

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MISC (20)：

ZG Li, S Miyake, M Kumagai, H Saito, Y Muramatsu. Hard nanocomposite Ti-Cu-N films prepared by dc reactive magnetron co-sputtering. SURFACE & COATINGS TECHNOLOGY. 2004. 183. 1. 62-68
S Miyake. Millimeter-wave materials processing in Japan by high-power gyrotron. IEEE TRANSACTIONS ON PLASMA SCIENCE. 2003. 31. 5. 1010-1015
Preparation of high quality strontium titanate based thin films by ECR plasma sputtering. Surface and Coating Technology. 2003. 169-170, 27-31
Preparation of High Quality Perovskite Oxide Films by ECR Plasma Sputtering and Millimeter-wave Irradiation. Proc. of 3rd Intl. Conf. on Surface Engineering, Oct. 10-13, Chengdu, China, 62-66. 2002
Low Temperature Processing of Bulk and Thin Film Ceramics by Microwave Radiation. D5 Abst. Intl. Workshop of Strong Microwaves in Plasma, Nizhny Novgorod, Russia, Aug. 1-9,. 2002

ｍore...

Patents (3)：

高真空・高速イオン処理装置
高密度ミリ波によるセラミックスの製造
高強度軟X線発生方法

Education (6)：

- 1969 Nagoya University
- 1969 Nagoya University Graduate School, Division of Natural Science
- 1966 Osaka University
- 1966 Osaka University Graduate School, Nuclear Engineering
- 1964 Osaka University School of Engineering

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Professional career (2)：

(BLANK) (Nagoya University)
工学修士 (大阪大学)

Awards (1)：

2000 - 岡田科学技術賞

Association Membership(s) (3)：

粉体粉末冶金協会 , 高温学会 , 応用物理学会

※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

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