Art
J-GLOBAL ID：200902234990088171   Reference number：04A0002874

Preparation of high quality strontium titanate based thin films by ECR plasma sputtering

ECRプラズマスパッタリング法による高品質チタン酸ストロンチウム基薄膜の作製
Author (4)：
MIYAKE S

About MIYAKE S

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
BABA S

About BABA S

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
NIINO A

About NIINO A

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
NUMATA K

About NUMATA K

(Kanagawa High Technol. Foundation (KTF), Kanagawa, JPN)

About Kanagawa High Technol. Foundation (KTF), Kanagawa, JPN


Material：
Surface & Coatings Technology  (Surf Coat Technol)

About Surface & Coatings Technology


Volume： 169/170  Page： 27-31  Publication year： Jun. 02, 2003 
JST Material Number： D0205C  ISSN： 0257-8972  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
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All keywords is available on JDreamIII(charged).
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sputtering

About sputtering

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
ECRプラズマ

About ECRプラズマ

, 
スパッタリング法

About スパッタリング法

, 
高品質

About 高品質

, 
チタン酸ストロンチウム

About チタン酸ストロンチウム

, 
薄膜

About 薄膜

, 
作製

About 作製


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