Art
J-GLOBAL ID：200902004893923834   Reference number：88A0101967

Synchrotron radiation-excited chemical-vapor deposition and etching.

シンクロトロン光励起の化学蒸着とエッチング
Author (2)：
URISU T

About URISU T

(NTT Electrical Communications Lab., Atsugi-shi, JPN)

About NTT Electrical Communications Lab., Atsugi-shi, JPN

, 
KYURAGI H

About KYURAGI H

(NTT Electrical Communications Lab., Atsugi-shi, JPN)

About NTT Electrical Communications Lab., Atsugi-shi, JPN


Material：
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)

About Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures


Volume： 5  Issue： 5  Page： 1436-1440  Publication year： Sep. 1987 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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All keywords is available on JDreamIII(charged).
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synchrotron radiation

About synchrotron radiation

,...
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JST classification (1)：
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Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
シンクロトロン

About シンクロトロン

, 
光励起

About 光励起

, 
化学蒸着

About 化学蒸着

, 
エッチング

About エッチング


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