Art
J-GLOBAL ID:200902006176417323   Reference number:91A0233022

X-ray mask fogging by electrons backscattered beneath the membrane.

支持膜下方での後方散乱電子によるX線マスクのかぶり
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Material:
Volume:Issue:Page: 1618-1623  Publication year: Nov. 1990 
JST Material Number: E0974A  ISSN: 1071-1023  CODEN: JVTBD9  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  X-ray instruments and techniques 
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