Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization.

MUSIL J; KADLEC S; MUENZ W-D

Art

J-GLOBAL ID：200902039013001419 Reference number：91A0658322

Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization.

アンバランスマグネトロンと増強プラズマイオン化を用いた新しいスパッタ装置

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Material：
Volume： 9 Issue： 3 Pt 1 Page： 1171-1177 Publication year： May. 1991
JST Material Number： C0789B ISSN： 0734-2101 CODEN： JVTAD6 Document type： Article
Article type：文献レビュー Country of issue： United States (USA) Language： ENGLISH (EN)

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Techniques and equipment of thin film deposition , Ceramic coating to metallic materials

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