Low-temperature processing of titanium nitride films by laser physical vapor deposition.

BIUNNO N; NARAYAN J; HOFMEISTER S K; SRIVATSA A R; SINGH R K

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J-GLOBAL ID：200902073461932788 Reference number：89A0464796

Low-temperature processing of titanium nitride films by laser physical vapor deposition.

レーザ物理蒸着による窒化チタン膜の低温処理

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Material：
Volume： 54 Issue： 16 Page： 1519-1521 Publication year： Apr. 17, 1989
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Laser irradiation effects and damages

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