Art
J-GLOBAL ID：200902085398058264   Reference number：84A0246557

A dual grating alignment technique for x-ray lithography.

X線リソグラフィー用双格子整合法
Author (3)：
KINOSHITA H

About KINOSHITA H

(Atsugi Electrical Communication Lab.)

About Atsugi Electrical Communication Lab.

, 
UNE A

About UNE A

(Atsugi Electrical Communication Lab.)

About Atsugi Electrical Communication Lab.

, 
IKI M

About IKI M

(Atsugi Electrical Communication Lab.)

About Atsugi Electrical Communication Lab.


Material：
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)

About Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures


Volume： 1  Issue： 4  Page： 1276-1279  Publication year： Oct. 1983 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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X-ray irradiation

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,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

,  X-ray instruments and techniques 
(BA02060D)

About X-ray instruments and techniques

Terms in the title (2)：
Terms in the title
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X線リソグラフィー

About X線リソグラフィー

, 
格子整合

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