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J-GLOBAL ID:200902092638621618   Reference number:89A0338978

A mathematical model of the fluid mechanics and gas-phase chemistry in a rotating disk chemical vapor deposition reactor.

回転円盤型化学蒸着リアクタ中の流体力学および気相化学の数学モデル
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Volume: 136  Issue:Page: 819-829  Publication year: Mar. 1989 
JST Material Number: C0285A  ISSN: 1945-7111  CODEN: JESOAN  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Thin films in general  ,  Manufacturing technology of solid-state devices 

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