Art
J-GLOBAL ID：200902099989120610   Reference number：86A0537379

Compensation in epitaxial cubic SiC films.

エピタキシャル立方晶系SiC膜における不純物補償
Author (4)：
SEGALL B

About SEGALL B

(Case Western Reserve Univ., Ohio)

About Case Western Reserve Univ., Ohio

, 
ALTEROVITZ S A

About ALTEROVITZ S A

(Lewis Research Center National Aeronautics and Space Administration, Ohio)

About Lewis Research Center National Aeronautics and Space Administration, Ohio

, 
HAUGLAND E J

About HAUGLAND E J

(Lewis Research Center National Aeronautics and Space Administration, Ohio)

About Lewis Research Center National Aeronautics and Space Administration, Ohio

, 
MATUS L G

About MATUS L G

(Lewis Research Center National Aeronautics and Space Administration, Ohio)

About Lewis Research Center National Aeronautics and Space Administration, Ohio


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 49  Issue： 10  Page： 584-586  Publication year： Sep. 08, 1986 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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chemical vapor deposition

About chemical vapor deposition

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Electric conduction in crystalline semiconductors 
(BM03043X)

About Electric conduction in crystalline semiconductors

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
エピタキシャル

About エピタキシャル

, 
立方晶系

About 立方晶系

, 
SiC

About SiC

, 
不純物補償

About 不純物補償


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