Determination of Thickness of Thin Thermal Oxide Layers on Czochralski-Grown Silicon Wafers from their Longitudinal Optical Vibrational Mode.

SHIRAI H; TAKEDA R

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J-GLOBAL ID：200902102429818175 Reference number：96A0721346

Determination of Thickness of Thin Thermal Oxide Layers on Czochralski-Grown Silicon Wafers from their Longitudinal Optical Vibrational Mode.

Czochralski法で成長させたシリコンウエハ上の薄い熱酸化膜の厚さの縦光学振動モードによる決定

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Material：
Volume： 35 Issue： 7 Page： 3876-3877 Publication year： Jul. 1996
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Oxide thin films , Infrared spectra,Raman scattering and Raman spectra of inorganic compounds

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HARBECKE, B. Appl.Phys. 1985, A38, 263
GROSSE, P. Appl.Phys. 1986, A39, 257
BERREMAN, D. W. Phys.Rev. 1963, 130, 2193
BAGHDADI, A. J.Electrochem.Soc. 1989, 136, 2015

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