Art
J-GLOBAL ID:200902104446576110   Reference number:99A0601056

Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.

ヘキサメチルジシラザンのプラズマ支援化学蒸着による誘電体薄膜の調製
Author (4):
Material:
Volume: 12  Issue:Page: 39-44  Publication year: 1999 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=99A0601056&from=J-GLOBAL&jstjournalNo=L0202A") }}
JST classification (2):
JST classification
Category name(code) classified by JST.
Applications of plasma  ,  Thin films of other inorganic compounds 
Substance index (1):
Substance index
Chemical Substance indexed to the Article.
Terms in the title (4):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page