Art
J-GLOBAL ID：200902106372943844   Reference number：99A0052270

Internal stress control of boron thin film.

ほう素薄膜の内部応力制御
Author (4)：
SATOMI N

About SATOMI N

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
KITAMURA M

About KITAMURA M

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
SASAKI T

About SASAKI T

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN

, 
NISHIKAWA M

About NISHIKAWA M

(Osaka Univ., Osaka, JPN)

About Osaka Univ., Osaka, JPN


Material：
Fusion Engineering and Design  (Fusion Eng Des)

About Fusion Engineering and Design


Volume： 39/40  Page： 493-497  Publication year： Sep. 1998 
JST Material Number： T0497A  ISSN： 0920-3796  CODEN： FEDEEE  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
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Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*thin film growth

About thin film growth

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Thin films of other inorganic compounds 
(BK14060A)

About Thin films of other inorganic compounds

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
ほう素

About ほう素

, 
薄膜

About 薄膜


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