Art

J-GLOBAL ID：200902109181522716   Reference number：02A0698092

Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source.

コンパクトな電子ビーム励起プラズマ源を利用したダイヤモンド状炭素の蒸着

Author (5)： TADA S (Nagoya Univ., Nagoya, JPN) ,  ITO M (Wakayama Univ., Wakayama, JPN) ,  HAMAGAKI M (Inst. Physical and Chemical Res. (RIKEN), Saitama, JPN) ,  HORI M (Nagoya Univ., Nagoya, JPN) ,  GOTO T (Nagoya Univ., Nagoya, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 41  Issue： 8  Page： 5408-5414  Publication year： Aug. 15, 2002 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *DLC film ,...
Semi thesaurus term： EBEP

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JST classification (1)： Thin films of other inorganic compounds  (BK14060A)

Substance index (2)： Toluene ,  Ethylene

Reference (10)：

• 1) J. C. Angus, P. Koidl and S. Domitz: Plasma Deposited Thin Films, eds. J. Mort and F. Jansen (Chemical Rubber, Boca Raton, FL, 1988) p. 89.
• 2) Diamond and Diamond-Like Films and Coatings, eds. R. E. Clausing, L. L. Horton, J. C. Angus and P. Koidl (Plenum, New York, 1991).
• 3) E. S. Murdock R. F. Simmons and R. Davidson: IEEE Trans. Magn. 28 (1992) 3078.
• 4) C. V. Deshpandey and R. F. Bunshah: J. Vac. Sci. Technol. A 7 (1989) 2294.
• 5) M. Hamagaki and T. Hara: Jpn. J. Appl. Phys. 33 (1994) L383.

Terms in the title (3)： プラズマ源 ,  ダイヤモンド状炭素 ,  蒸着