Art

J-GLOBAL ID：200902113017982754   Reference number：00A0692922

Novel Photoacid Generators.

新規な光酸発生剤

Author (3)： ASAKURA T (Ciba Specialty Chemicals K.K. Japan, Takarazuka, JPN) ,  YAMATO H (Ciba Specialty Chemicals K.K. Japan, Takarazuka, JPN) ,  OHWA M (Ciba Specialty Chemicals K.K. Japan, Takarazuka, JPN)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 13  Issue： 2  Page： 223-230  Publication year： 2000 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *photoacid generator ,...
Semi thesaurus term： ネガティブ型レジスト ,...

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JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Photochemical reactions  (CB08020F)

Substance index (5)： Methanesulfonic acid 5-(α-cyano-2-methylbenzylidene)thiophene-2(5H)-ylideneamino ester ,  o-Tolyl[5-(propylsulfonyloxyimino)thiophene-2(5H)-ylidene]acetonitrile ,  Propylene glycol methyl ether acetate ,  Triphenylsulfonium・triphenylmethanesulfonic acid ,  Triphenylsulfonium

Reference (10)：

• 1). For example, R. Dammel, "Diazonaphthoquinone-based Resists", Volume TT 11, SPIE Optical Engineering Press, Washington, D. C. (1993) p 9-96.
• 2). G. Buhr, R. Dammel and C. R. Lindley, Polym. Mater. Sci. Eng., 61 (1989) 269.
• 3). W. Brunsvold, W. Montgomery and B. Hwang, Proc. SPIE, 1466 (1991) 368.
• 4). T. Yamaoka, T. Omote, H. Adachi, N. Kikuchi, Y. Watanabe and T. Shirosaki, J. Photopolym. Sci. Technol., 3, 3 (1990) 275.
• 5). G. Berner and W. Rutsch, US patent 4540598.

Terms in the title (1)： 光酸発生剤