Art
J-GLOBAL ID：200902114315432917   Reference number：96A0909174

Crystal growth of ITO films prepared by DC magnetron sputtering on C film.

C膜上に直流マグネトロンスパッタリングによって作製したITO膜の結晶成長
Author (3)：
MORIKAWA H

About MORIKAWA H

(Nagoya Inst. Technol., Nagoya, JPN)

About Nagoya Inst. Technol., Nagoya, JPN

, 
SUMI H

About SUMI H

(Nagoya Inst. Technol., Nagoya, JPN)

About Nagoya Inst. Technol., Nagoya, JPN

, 
KOHYAMA M

About KOHYAMA M

(Nagoya Inst. Technol., Nagoya, JPN)

About Nagoya Inst. Technol., Nagoya, JPN


Material：
Thin Solid Films

About Thin Solid Films


Volume： 281/282  Issue： 1/2  Page： 202-205  Publication year： Aug. 01, 1996 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
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sputtered deposition

About sputtered deposition

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ITO(solid solution)

About ITO(solid solution)


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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
直流マグネトロンスパッタリング

About 直流マグネトロンスパッタリング

, 
作製

About 作製

, 
ITO膜

About ITO膜

, 
結晶成長

About 結晶成長


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