Art
J-GLOBAL ID：200902116028039999   Reference number：00A0362764

Magnetron sputtering: a review of recent developments and applications.

マグネトロンスパッタリング 最近の開発と応用の概説
Author (2)：
KELLY P J

About KELLY P J

(Univ. Salford, Salford, GBR)

About Univ. Salford, Salford, GBR

, 
ARNELL R D

About ARNELL R D

(Univ. Salford, Salford, GBR)

About Univ. Salford, Salford, GBR


Material：
Vacuum

About Vacuum


Volume： 56  Issue： 3  Page： 159-172  Publication year： Mar. 2000 
JST Material Number： E0347A  ISSN： 0042-207X  Document type： Article
Article type： 解説  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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*magnetron sputtering

About magnetron sputtering

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

,  Ceramic coating to metallic materials 
(YC02050V)

About Ceramic coating to metallic materials

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
マグネトロンスパッタリング

About マグネトロンスパッタリング

, 
開発

About 開発

, 
応用

About 応用


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