Influence of Sputtering Target Material on Crystallinity and Orientation of AlN Thin Films.

AKIYAMA M; XU C-N; HAGIO T; NONAKA K

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J-GLOBAL ID：200902116207304786 Reference number：02A0223968

Influence of Sputtering Target Material on Crystallinity and Orientation of AlN Thin Films.

スパッタリングターゲット材料の窒化アルミニウム薄膜の結晶性及び配向性への影響

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Material：
Volume： 110 Issue： 1278 Page： 115-117 Publication year： Feb. 01, 2002
JST Material Number： F0382A ISSN： 0914-5400 CODEN： JCSJEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Properties of ceramics and ceramic whiteware , Thin films of other inorganic compounds

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