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J-GLOBAL ID:200902116799790220   Reference number:93A0912325

Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO2 films.

エピタキシャルTiO2膜の超高真空有機金属化学蒸着とその場評価
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Volume: 11  Issue:Page: 2419-2429  Publication year: Sep. 1993 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films 
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