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J-GLOBAL ID:200902118406422383   Reference number:02A0329852

Thermal agglomeration of single-crystalline Si layer on buried SiO2 in ultrahigh vacuum.

超高真空中における埋込みSiO2上の単結晶Si層の熱凝集
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Volume: 20  Issue:Page: 167-172  Publication year: Jan. 2002 
JST Material Number: E0974A  ISSN: 1071-1023  CODEN: JVTBD9  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Solid phase transitions 
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