Resist pattern fluctuation limits in extreme-ultraviolet lithography.

SCHECKLER E W; OGAWA T; YAMANASHI H; SOGA T; ITO M

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J-GLOBAL ID：200902122267297983 Reference number：94A0825530

Resist pattern fluctuation limits in extreme-ultraviolet lithography.

極紫外リソグラフィーにおけるレジストパターンゆらぎの限界

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Material：
Volume： 12 Issue： 4 Page： 2361-2371 Publication year： Jul. 1994
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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