Art
J-GLOBAL ID：200902124531661810   Reference number：95A0639088

In situ real time studies of the formation of polycrystalline silicon films on glass grown by a layer-by-layer technique.

層状成長法によるガラス上への多結晶シリコン膜形成のその場実時間研究
Author (2)：
AKASAKA T

About AKASAKA T

(Tokyo Inst. Technol., Yokohama, JPN)

About Tokyo Inst. Technol., Yokohama, JPN

, 
SHIMIZU I

About SHIMIZU I

(Tokyo Inst. Technol., Yokohama, JPN)

About Tokyo Inst. Technol., Yokohama, JPN


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 66  Issue： 25  Page： 3441-3443  Publication year： Jun. 19, 1995 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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polycrystal

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,...
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Thesaurus term/Semi thesaurus term
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HR-CVD

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,...
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JST classification (1)：
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Semiconductor thin films 
(BK14040E)

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Terms in the title (4)：
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ガラス

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, 
多結晶シリコン膜

About 多結晶シリコン膜

, 
実時間

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, 
研究

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