Outlook for 157nm resist design.

KUNZ R R; BLOOMSTEIN T M; HARDY D E; GOODMAN R B; DOWNS D K; CURTIN J E

Art

J-GLOBAL ID：200902126965627443 Reference number：00A0122773

Outlook for 157nm resist design.

157nmレジスト設計の展望

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Author (6)： , , , , ,
Material：
Volume： 17 Issue： 6 Page： 3267-3272 Publication year： Nov. 1999
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Techniques for samples

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