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J-GLOBAL ID:200902127272909085   Reference number:99A0396261

Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering.

高周波プラズマ補助マグネトロンスパッタリングによって作製したTi-Al-N薄膜の相転移と相特性
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Material:
Volume: 339  Issue: 1/2  Page: 203-208  Publication year: Feb. 08, 1999 
JST Material Number: B0899A  ISSN: 0040-6090  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Thin films of other inorganic compounds  ,  Solid phase transitions 

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