Art
J-GLOBAL ID：200902129357867732
Reference number：00A0519939
Effective Diffusion Coefficient and Controlling Process of P Diffusion in Si Based on the Pair Diffusion Models of Vacancy and Interstitial Mechanisms.
空格子点機構と格子間機構の対拡散模型に基づくSi中のP拡散の有効拡散係数と制御過程
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Author (4)：
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Material：
Volume：
39
Issue：
5A
Page：
2483-2491
Publication year：
May. 15, 2000
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Diffusion in solids in general
Terms in the title (7)：
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