Art
J-GLOBAL ID：200902131226162843
Reference number：97A0194392
Electron-beam induced etching of resist with water vapor as the etching medium.
エッチング媒質として水蒸気を用いたレジストの電子ビーム誘起エッチング
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Author (2)：
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Material：
Volume：
14
Issue：
6
Page：
4262-4266
Publication year：
Nov. 1996
JST Material Number：
E0974A
ISSN：
1071-1023
CODEN：
JVTBD9
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices
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