Art
J-GLOBAL ID：200902131867066720   Reference number：02A0225962

In situ observation of nickel metal-induced lateral crystallization of amorphous silicon thin films.

非晶質けい素薄膜のニッケル金属誘起横方向結晶化のその場観察
Author (3)：
MIYASAKA M

About MIYASAKA M

(Seiko Epson Corp., Suwa, JPN)

About Seiko Epson Corp., Suwa, JPN

, 
MAKIHIRA K

About MAKIHIRA K

(Kyushu Inst. Technol., Iizuka, JPN)

About Kyushu Inst. Technol., Iizuka, JPN

, 
ASANO T

About ASANO T

(Kyushu Inst. Technol., Iizuka, JPN)

About Kyushu Inst. Technol., Iizuka, JPN


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 80  Issue： 6  Page： 944-946  Publication year： Feb. 11, 2002 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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amorphous semiconductor

About amorphous semiconductor

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Crystal growth of semiconductors 
(BK13040X)

About Crystal growth of semiconductors

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
非晶質

About 非晶質

, 
けい素薄膜

About けい素薄膜

, 
ニッケル

About ニッケル

, 
金属誘起横方向結晶化

About 金属誘起横方向結晶化

, 
その場観察

About その場観察


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